Nanoscale Energy & Surface Engineering Group

Magnetron sputtering

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Magnetron sputtering is a deposition technology involving a gaseous plasma which is generated and confined to a space containing the material to be deposited – i.e., the 'target'. Electrons which are present in the sputtering gas are accelerated away from the cathode causing collisions with nearby atoms of sputtering gas, resulting in the formation of thin films 

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We use magnetron sputtering to prepare oxide and nitride thin films